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Photolithography is a key technology that has enabled the rapid development of the semiconductor industry during the past 60 years. It is a technique that enables geometric features to be transferred from a mask to a photo-responsive material (photoresist) deposited on a substrate. New types of photoresists are needed for the next generation of photolithography, which uses extreme ultraviolet radiation. Yu Zhang focuses on two kinds of organotin materials as model photoresists: tin oxo cages and tin(II) carboxylate molecules.

Event details of Organotin photoresists for extreme ultraviolet lithography
Date 11 April 2019
Time 14:00 -15:00
Location Agnietenkapel
Room Location

Y. Zhang: Organotin Photoresists for Extreme Ultraviolet Lithography.

Supervisor

Prof. A.M. Brouwer 

Co-supervisors

Prof. P.C.M. Planken

Dr S. Castellanos Ortega

Entrance

This event is open to the public.

Agnietenkapel

Room Location

Oudezijds Voorburgwal 229 - 231
1012 EZ Amsterdam